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Structural and Electronic Properties of Amorphous and Polycrystalline In2Se3 Films

机译:非晶和多晶硅的结构和电子性质   In2se3电影

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摘要

Structural and electronic properties of amorphous and single-phasepolycrystalline films of gamma- and kappa-In2Se3 have been measured. The stablegamma phase nucleates homogeneously in the film bulk and has a highresistivity, while the metastable kappa phase nucleates at the film surface andhas a moderate resistivity. The microstructures of hot-deposited andpost-annealed cold-deposited gamma films are quite different but the electronicproperties are similar. The increase in the resistivity of amorphous In2Se3films upon annealing is interpreted in terms of the replacement of In-In bondswith In-Se bonds during crystallization. Great care must be taken in thepreparation of In2Se3 films for electrical measurements as the presence ofexcess chalcogen or surface oxidation may greatly affect the film properties.
机译:已经测量了γ-和κ-In2 Se 3的非晶和单相多晶膜的结构和电子性质。稳定的γ相在膜体中均匀成核,并具有高电阻率,而亚稳态的κ相在膜表面成核并具有适度的电阻率。热沉积和退火后的冷沉积伽马膜的微观结构是完全不同的,但是电子性质是相似的。非晶态In2Se3薄膜退火后电阻率的增加可以用结晶过程中用In-Se键替换In-In键来解释。 In2Se3膜的制备必须非常小心以进行电测量,因为过量的硫属元素或表面氧化的存在可能会极大地影响膜的性能。

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